Low loss InP membrane photonic integrated circuits enabled by 193-nm deep UV lithography
| Autor: | Yuqing Jiao, Sander Reniers, Kevin A. Williams, Jorn P. van Engelen, Jos J. G. M. van der Tol, Jeroen Bolk |
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| Přispěvatelé: | Photonic Integration |
| Jazyk: | angličtina |
| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Materials science business.industry Photonic integrated circuit Nanophotonics 02 engineering and technology Integrated circuit Mach–Zehnder interferometer 01 natural sciences law.invention Resonator Interferometry 020210 optoelectronics & photonics Membrane law microring resonator 0103 physical sciences 0202 electrical engineering electronic engineering information engineering Optoelectronics Mach-Zehnder interferometer Photolithography photonic integrated circuit business propagation loss |
| Zdroj: | 2019 Compound Semiconductor Week, CSW 2019-Proceedings |
| Popis: | For the first time we demonstrate the application of 193 nm optical lithography to InP-Membrane-on-Silicon (IMOS) passive nanophotonic integrated circuits. A record low propagation loss of $1. 3\pm 0.1\mathbf{dB}/\mathbf{cm}$ is demonstrated in a Mach-Zehnder interferometer (MZI) circuit and a microring resonator Q-factor up to $62 \cdot 10^{3}$ with 4 nm FSR is measured. |
| Databáze: | OpenAIRE |
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