Optical Direct Write of Dolan--Niemeyer-Bridge Junctions for Transmon Qubits
| Autor: | Kater Murch, K. Zheng, J. Brewster, David Wisbey, C. Gaikwad, J. T. Monroe, D. Kowsari |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Josephson effect
Materials science Physics and Astronomy (miscellaneous) Evaporation FOS: Physical sciences 02 engineering and technology 01 natural sciences law.invention law 0103 physical sciences Mesoscale and Nanoscale Physics (cond-mat.mes-hall) 010306 general physics Lithography Quantum tunnelling Quantum Physics Condensed Matter - Mesoscale and Nanoscale Physics business.industry Transmon 021001 nanoscience & nanotechnology Resist Qubit Optoelectronics Photolithography 0210 nano-technology business Quantum Physics (quant-ph) |
| DOI: | 10.48550/arxiv.2106.09034 |
| Popis: | We characterize highly coherent transmon qubits fabricated with a direct-write photolithography system. Multi-layer evaporation and oxidation allows us to change the critical current density by reducing the effective tunneling area and increasing the barrier thickness. Surface treatments before resist application and again before evaporation result in high coherence devices. With optimized surface treatments we achieve energy relaxation $T_1$ times in excess of $80\ \mu$s for three dimensional transmon qubits with Josephson junction lithographic areas of 2 $\mu\mathrm{m}^2$. Comment: 7 pages, 3 figures |
| Databáze: | OpenAIRE |
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