Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography
| Autor: | N. N. Salashchenko, S. A. Gusev, Andrey Sokolov, D. A. Tatarskiy, M.G. Sertsu, Nikolay I. Chkhalo, M. V. Zorina, A. E. Pestov, A. N. Nechay, Vladimir N. Polkovnikov, Yu. A. Vainer, D. E. Pariev, Franz Schäfers, M. V. Svechnikov |
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| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Materials science Scattering business.industry Extreme ultraviolet lithography 02 engineering and technology Surface finish engineering.material 021001 nanoscience & nanotechnology 01 natural sciences Atomic and Molecular Physics and Optics Optics Coating Transmission electron microscopy 0103 physical sciences engineering Reflection (physics) Reflection coefficient 0210 nano-technology business Reflectometry |
| Zdroj: | Optics express. 26(26) |
| ISSN: | 1094-4087 |
| Popis: | A comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin B4C, C and Si interlayers. It was demonstrated that Mo/Be mirrors show maximum reflectance at normal incidence, while maximum structural perfection is shown by Mo/Be/Si mirrors. The introduction of B4C and C layers into the structure increases the interlayer roughness and reduces the sharpness of the interfaces, adversely affecting the target coating characteristics. Results are presented for studies using four techniques: X-ray reflectometry, small-angle X-ray scattering, atomic force microscopy, and transmission electron microscopy. |
| Databáze: | OpenAIRE |
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