Ray-based method for simulating cascaded diffraction in high-numerical-aperture systems
| Autor: | Paul Urbach, Andreas Flesch, Florian Bociort, Michael Wick, Marco Mout, J. Petschulat |
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| Jazyk: | angličtina |
| Rok vydání: | 2018 |
| Předmět: |
Diffraction
Electromagnetic field Physics business.industry Propagator Physics::Optics 02 engineering and technology Fresnel equations 021001 nanoscience & nanotechnology 01 natural sciences Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Numerical aperture Huygens–Fresnel principle 010309 optics Ray tracing (physics) symbols.namesake Optics 0103 physical sciences symbols Computer Vision and Pattern Recognition 0210 nano-technology business Distributed ray tracing |
| Zdroj: | Journal of the Optical Society of America A: Optics and Image Science, and Vision, 35(8) |
| ISSN: | 1084-7529 |
| Popis: | The electric field at the output of an optical system is in general affected by both aberrations and diffraction. Many simulation techniques treat the two phenomena separately, using a geometrical propagator to calculate the effects of aberrations and a wave-optical propagator to simulate the effects of diffraction. We present a ray-based simulation method that accounts for the effects of both aberrations and diffraction within a single framework. The method is based on the Huygens–Fresnel principle, is entirely performed using Monte Carlo ray tracing, and, in contrast to our previously published work, is able to calculate the full electromagnetic field. The method can simulate the effects of multiple diffraction in systems with a high numerical aperture. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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