Optimizing the Tungsten Deposition Process

Autor:	M. Silberg, R. Saad, Z. Lando, Y. Dafne
Rok vydání:	1996
Předmět:	Technology Materials science Chemical technology Metallurgy Chemicals: Manufacture use etc chemistry.chemical_element TP200-248 TP1-1185 Tungsten Condensed Matter Physics chemistry Mechanics of Materials General Materials Science Physical and Theoretical Chemistry Deposition process
Zdroj:	High Temperature Materials and Processes, Vol 15, Iss 3, Pp 217-222 (1996)
ISSN:	2191-0324 0334-6455
DOI:	10.1515/htmp.1996.15.3.217
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::47b2c49544abe5805f88aa2f075d6670 https://doi.org/10.1515/htmp.1996.15.3.217 Zobrazit plný text záznamu