High density electron emission source based on carbon nanotubes for industrial applications
Autor: | F. Suriano, G.P. Veronese, R. Rizzoli, R. Angelucci |
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Jazyk: | angličtina |
Rok vydání: | 2009 |
Předmět: |
Materials science
Nanoscale materials Silicon Mechanical Engineering Doping chemistry.chemical_element Mineralogy General Chemistry Carbon nanotube Electron Carbon nanotube devices Electronic Optical and Magnetic Materials Catalysis law.invention Field emission Nickel Field electron emission chemistry Chemical engineering law Materials Chemistry Electrical and Electronic Engineering Tin |
Zdroj: | Diamond and related materials 18 (2009): 963–966. doi:10.1016/j.diamond.2009.02.005 info:cnr-pdr/source/autori:Veronese GP; Angelucci R; Suriano F; Rizzoli R/titolo:High density electron emission source based on carbon nanotubes for industrial applications/doi:10.1016%2Fj.diamond.2009.02.005/rivista:Diamond and related materials/anno:2009/pagina_da:963/pagina_a:966/intervallo_pagine:963–966/volume:18 |
DOI: | 10.1016/j.diamond.2009.02.005 |
Popis: | Vertically aligned multi-walled carbon nanotubes (MWCNTs) have been grown by Catalyzed-Chemical Vapour Deposition (C-CVD) both on bare doped silicon and thin TiN film on silicon, using iron and nickel as catalyst, respectively. The aim is the development of high density and stable cold emission sources for industrial applications. Field emission characteristics of MWCNTs have been evaluated, obtaining current densities up to 150 mA/cm(2) at applied electrical field of 6 V/mu m. Emission measurements have been performed which prove a medium-term stability. Structural and morphological characterization of MWCNTs has been carried out by SEM and Raman spectroscopy. |
Databáze: | OpenAIRE |
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