Preparation of Atomically Flat TiO2(110) Substrate
| Autor: | SHIMIZU, R, Hitosugi, Taro, NAKAYAMA, KS, SAKURAI, T, SHIRAIWA, M, HASEGAWA, T, HASHIZUME, T |
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| Jazyk: | angličtina |
| Rok vydání: | 2009 |
| Předmět: |
Auger electron spectroscopy
Materials science Physics and Astronomy (miscellaneous) Annealing (metallurgy) General Engineering Analytical chemistry Oxide General Physics and Astronomy Epitaxy Isotropic etching law.invention chemistry.chemical_compound Electron diffraction chemistry law Rutile Scanning tunneling microscope |
| Zdroj: | JAPANESE JOURNAL OF APPLIED PHYSICS. 48(No. 12) |
| Popis: | The temperature dependence of step/terrace surfaces of rutile TiO2(110) substrates, prepared by chemical etching and thermal annealing, was examined by scanning tunneling microscopy, low-energy electron diffraction, and Auger electron spectroscopy in ultrahigh vacuum. Whereas disordered step/terrace structures appeared when the sample was heated at temperatures in the range 675–850 °C, we have succeeded in obtaining atomically flat and clean TiO2(110) (1×1) surfaces following annealing at 900 °C. Additional heating of the atomically-ordered surfaces at lower temperatures induced no structural changes. This simple approach is an important starting point for the further growth of oxide epitaxial layers. |
| Databáze: | OpenAIRE |
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