Ion-beam polishing of fused silica substrates for imaging soft x-ray and extreme ultraviolet optics
| Autor: | M. S. Mikhaylenko, N. N. Salashchenko, S. A. Churin, A. E. Pestov, Nikolay I. Chkhalo, Vladimir N. Polkovnikov, M. V. Zorina |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Range (particle radiation) Materials science Ion beam business.industry Materials Science (miscellaneous) Polishing Surface finish 01 natural sciences Industrial and Manufacturing Engineering Numerical aperture Ion 010309 optics Optics Extreme ultraviolet 0103 physical sciences Surface roughness Business and International Management business |
| Zdroj: | Applied optics. 55(6) |
| ISSN: | 1539-4522 |
| Popis: | We have studied the surface treatment of polished fused silica by neutralized Ar ions with energy of 500-1500 eV and incidence angles of 0-90°. We found the following regularities: for samples that passed the standard procedure of deep polishing (initial effective roughness σ(eff)∼0.5 nm), the effective roughness decreases to the ultrasmooth level (i.e., σ(eff)∼0.25 nm in the range of spatial frequencies q∈[4.9×10(-2)-63] μm(-1)). The effect begins to be noticeable at the material removal of 150 nm and reaches saturation at depths of removal greater than 1 μm. For supersmooth samples (σ(eff) |
| Databáze: | OpenAIRE |
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