Surface oxidation of liquid Sn
| Autor: | Jeffrey Gebhardt, Christoph Steimer, Tim Graber, Peter S. Pershan, Binhua Lin, Mati Meron, Alexei Grigoriev, Oleg Shpyrko, Benjamin M. Ocko, Moshe Deutsch |
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| Jazyk: | angličtina |
| Rok vydání: | 2004 |
| Předmět: |
Liquid metal
Condensed Matter - Materials Science Scattering Kinetics Oxide Analytical chemistry Materials Science (cond-mat.mtrl-sci) FOS: Physical sciences chemistry.chemical_element Surfaces and Interfaces Condensed Matter Physics 01 natural sciences Chemical reaction Oxygen 010305 fluids & plasmas Surfaces Coatings and Films chemistry.chemical_compound Crystallography chemistry 0103 physical sciences Materials Chemistry Thin film 010306 general physics Tin |
| Popis: | We report the results of an x-ray scattering study that reveals oxidation kinetics and formation of a previously unreported crystalline phase of SnO at the liquid-vapour interface of Sn. Our experiments reveal that the pure liquid Sn surface does not react with molecular oxygen below an activation pressure of \~5.0*10-6 Torr. Above that pressure a rough solid Sn oxide grows over the liquid metal surface. Once the activation pressure has been exceeded the oxidation proceeds at pressures below the oxidation pressure threshold. The observed diffraction pattern associated with the surface oxidation does not match any of the known Sn oxide phases. The data have an explicit signature of the face-centred cubic structure, however it requires lattice parameters that are about 9% smaller than those reported for cubic structures of high-pressure phases of Sn oxides. Keywords: X-ray scattering, diffraction, and reflection; Oxidation; Surface chemical reaction; Surface structure, morphology, roughness, and topography; Tin; Tin oxides; Liquid surfaces; Polycrystalline thin films 18 pages, 6 figures, 1 table; Submitted to Surface Science |
| Databáze: | OpenAIRE |
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