| Autor: |
G. E. van Dorssen, E. J. Puik, M. J. van der Wiel, P. Mackle, H. A. Padmore, I. H. Munro |
| Rok vydání: |
2011 |
| Předmět: |
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| Zdroj: |
Journal of X-ray science and technology. 3(2) |
| ISSN: |
0895-3996 |
| Popis: |
The structure of Ni-C multilayer and single nickel layer samples has been analyzed before and after annealing, using two techniques: fluorescence EXAFS (F1EXAFS) at the Ni-K. edge and CuKα reflection. Annealing at a temperature of 450°C resulted in a change in the structure of the nickel layers from amorphous like to crystalline like. A reduction of the Bragg reflectivity by a factor of 7 was also found. Comparison between the EXAFS data of the annealed sample and of a nickel foil show a difference in the amplitude of the EXAFS. This is ascribed to a non-Gaussian atomic distribution of the backscattering atoms in the annealed sample around their average positions, whereas the atomic distribution in the (polycrystalline) Ni foil is a Gaussian one. From the annealing experiments we conclude that no irreversible changes take place in the structure of the nickel layers at temperatures below 200°C. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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