Large full-well capacity stitched CMOS image sensor for high temperature applications

Autor:	Christian Nitta, Werner Brockherde, Frank Matheis, Bedrich Hosticka, Daniel Durini
Jazyk:	angličtina
Rok vydání:	2010
Předmět:	CMOS sensor Materials science Pixel business.industry ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION Materialtechnik Photodiode law.invention Image stitching Optics CMOS law Hardware_INTEGRATEDCIRCUITS Reticle Optoelectronics Image sensor business Dark current
Zdroj:	ESSCIRC
Popis:	A novel CMOS pixel architecture is presented, which fulfills the need for acquisition of very high photon fluxes at high temperatures. A buried photodiode based pixel structure was analysed in detail, and then applied to fabricate the 256 } 256 large area imager sensor in a standard 0.5µm CMOS process using mask reticle stitching.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::45fc379e6cb1140e81f0d035e31f57b4 https://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&origin=inward&scp=78650343066 Zobrazit plný text záznamu