Study of InP Surfaces after Wet Chemical Treatments

Autor:	Dennis H. van Dorp, Dieter Schmeisser, Thierry Conard, Simone Brizzi, Massimo Tallarida, Sophia Arnauts, Daniel Cuypers, Stefan De Gendt, Christoph Adelmann, Leonard Rodriguez
Rok vydání:	2013
Předmět:	chemistry.chemical_compound Passivation Etching (microfabrication) law Chemistry Photoemission spectroscopy Immersion (virtual reality) Analytical chemistry Oxide Synchrotron radiation Composition (visual arts) Scanning tunneling microscope law.invention
Zdroj:	ECS Transactions. 58:297-303
ISSN:	1938-6737 1938-5862
Popis:	The influence of different wet chemical treatments (HCl, H₂SO₄, NH₄OH) on the composition of InP surfaces is studied by using synchrotron radiation photoemission spectroscopy (SRPES). It is shown that a significant amount of oxide remains present after immersion in a NH₄OH solution which is ascribed to the insolubility of In³⁺ at higher pH values. Acidic treatments efficiently remove the native oxide, although components like Pᴼ, Inᴼ and P(2±Δ)+ suboxides are observed. Alternatively, the influence of a passivation step in (NH₄)₂S solution on the surface composition was investigated. The InP surface after immersion into (NH₄)₂S results in fewer surface components, without detection of Pᴼ and P(2±Δ)+ suboxides. Finally, slight etching of InP surfaces in HCl/H₂O₂ solution followed by a native oxide removal step, showed no significant effect on the surface composition.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::44db10f60cbd65eda505404921b38054 https://doi.org/10.1149/05806.0297ecst Zobrazit plný text záznamu