The use of plasma source ion implantation for wear protection
| Autor: | Günzel, R., Brutscher, J., Mändl, S., Möller, W. |
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| Jazyk: | angličtina |
| Rok vydání: | 1997 |
| Zdroj: | Y. Pauleau and P. B. Barna (eds), Protective Coatings and Thin Films, pp. 635-647, c 1997 Kluwer Academic Publishers, Printed in the Netherlands Protective Coatings and Thin Films ISBN: 9789401063807 NATO-ARW, Portimao, Portugal, 30.5.-5.6.1996 |
| Popis: | Plasma source ion implantation (PSII) has been developed as an alternative technique to circumvent the limitations of conventional ion implantation, like the requirements of a complicated target handling and beam raster system for a uniform ion implantation of 3-dimensional samples. In this method, a plasma sheath conformably surrounds the target. By applying negative high voltage pulses, positively charged ions are accelerated from the plasma trough the sheath and implanted into the target. Critical parameters for the further development of this implantation process are the ion implantation current and the sheath expansion characteristics. |
| Databáze: | OpenAIRE |
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