Analysis of perovskite oxides etching using argon inductively coupled plasmas for photonics applications
| Autor: | Guanyu Chen, Aaron J. Danner, Yu Cao, Eric Jun Hao Cheung, Ji Sheng Pan |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Inductively coupled plasma etching
Materials science Analytical chemistry Oxide chemistry.chemical_element 02 engineering and technology chemistry.chemical_compound 020210 optoelectronics & photonics X-ray photoelectron spectroscopy Etching (microfabrication) lcsh:TA401-492 0202 electrical engineering electronic engineering information engineering Surface roughness Perovskite oxide General Materials Science Argon Spectroscopy Perovskite (structure) Nano Express 021001 nanoscience & nanotechnology Condensed Matter Physics Photonics chemistry lcsh:Materials of engineering and construction. Mechanics of materials Dry etching 0210 nano-technology |
| Zdroj: | Nanoscale Research Letters Nanoscale Research Letters, Vol 16, Iss 1, Pp 1-9 (2021) |
| DOI: | 10.21203/rs.3.rs-117471/v2 |
| Popis: | We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niobate (LN). The measured results are predictable and repeatable and can be applied to other perovskite oxides, such as X-cut LN and barium titanium oxide (BTO). The surface roughness is better for both etched LN and BTO compared with their as-deposited counterparts as confirmed by atomic force microscopy (AFM). Both the energy dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) methods have been used for surface chemical component comparisons, qualitative and quantitative, and no obvious surface state changes are observed according to the measured results. An optical waveguide fabricated with the optimized argon-based ICP etching was measured to have − 3.7 dB/cm loss near 1550 nm wavelength for Z-cut LN, which validates this kind of method for perovskite oxides etching in photonics applications. |
| Databáze: | OpenAIRE |
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