Photodegradation of Poly[methyl(phenyl)silylene] in the Presence of Modifying Substances
| Autor: | Anna Kochalska, Jakub Peter, Juraj Nožár, Stanislav Nešpůrek |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
chemistry.chemical_classification
Quantum chemical Materials science Polymers and Plastics Organic Chemistry Silylene Benzoyl peroxide Polymer Electron acceptor Condensed Matter Physics Photochemistry chemistry.chemical_compound chemistry Yield (chemistry) Materials Chemistry medicine Degradation (geology) Photodegradation medicine.drug |
| Zdroj: | ResearcherID |
| ISSN: | 1022-1360 |
| DOI: | 10.1002/masy.200900075 |
| Popis: | Efficiency of the photodegradation of poly[methyl(phenyl)silylene] can be increased by electron acceptor additives with unstable anion radicals. The best chain degradation yield was obtained using benzoyl peroxide as an additive. The model for the photodegradation process is supported by quantum chemical calculations. |
| Databáze: | OpenAIRE |
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