Liquid-Phase Quasi-Epitaxial Growth of Highly Stable, Monolithic UiO-66-NH₂ MOF thin Films on Solid Substrates

Autor: Hashem, T., Valadez Sánchez, E. P., Weidler, P. G., Gliemann, H., Alkordi, M. H., Wöll, C.
Jazyk: angličtina
Rok vydání: 2020
Předmět:
Zdroj: ChemistryOpen, 9 (5), 524-527
ISSN: 2191-1355
2191-1363
DOI: 10.5445/ir/1000105861
Popis: High quality, monolithic UiO‐66‐NH2 thin films on diverse solid substrates have been prepared via a low temperature liquid phase epitaxy method. The achievement of continuous films with low defect densities and great stability against high temperatures and hot water is proven, clearly outperforming other reported types of MOF thin films.
Databáze: OpenAIRE