Studi Penumbuhan Film Tipis Ti(1-x)Co(x)O(2) dengan Teknik MOCVD Menggunakan Prekurosr Titanium (IV) Isopropoxide dan Tris (2,2,6,6-tetramethyl-3,5-heptanedionato) Cobalt (III)
| Autor: | Edy Supriyanto, Horasdia Saragih, Pepen Arifin, M. Barmawi |
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| Rok vydání: | 2006 |
| Předmět: |
Science (General)
Multidisciplinary Materials science Ferromagnetic material properties Science Inorganic chemistry chemistry.chemical_element Solvent Q1-390 chemistry.chemical_compound chemistry Metalorganic vapour phase epitaxy Solubility Thin film Cobalt Tetrahydrofuran Titanium Nuclear chemistry |
| Zdroj: | Journal of Mathematical and Fundamental Sciences, Vol 38, Iss 2 (2013) |
| ISSN: | 1978-3043 |
| Popis: | The Ti 1-x Co x O 2 thin films have been grown by MOCVD technique using titanium (IV) isopropoxide (TTIP) and tris (2,2,6,6-tetramethyl-3, 5-heptanedionato) Cobalt (III ) [Co(TMHD) 3 ] powder precursors. The tetrahydrofuran (THF) were used as a solvent to get a Co(TMHD) 3 solution. Characteristics of precursor and growth parameters were investigated. The Co concentration in thin films were varied. The room temperature ferromagnetic properties of Ti 1-x Co x O 2 thin films were obtained. Solubility of Co atom in TiO 2 lattice were found at about 11%. The surface morphology of films are homogen and relatively smooth. |
| Databáze: | OpenAIRE |
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