Sputtered hydrogenated amorphous silicon thin films for distributed Bragg reflectors and long wavelength vertical cavity surface emitting lasers applications

Autor: A. Shuaib, N. Chevalier, C. Levallois, A. Le Corre, J. P. Gauthier, C. Paranthoen, Charles Cornet, Olivier Durand
Přispěvatelé: Fonctions Optiques pour les Technologies de l'informatiON (FOTON), Université de Rennes (UR)-Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne-Centre National de la Recherche Scientifique (CNRS), ANR-06-TCOM-0024,LAMBDAACCES,Sources laser accordables à cavité verticale pour les réseaux d'accès à très haut débit(2006), Institut National des Sciences Appliquées - Rennes (INSA Rennes), Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Centre National de la Recherche Scientifique (CNRS)-Université de Rennes 1 (UR1), Université de Rennes (UNIV-RENNES)-École Nationale Supérieure des Sciences Appliquées et de Technologie (ENSSAT)-Télécom Bretagne
Rok vydání: 2011
Předmět:
Amorphous silicon
Materials science
Silicon
chemistry.chemical_element
Optoelectronics devices
02 engineering and technology
01 natural sciences
7. Clean energy
Vertical-cavity surface-emitting laser
chemistry.chemical_compound
Optics
Vertical cavity surface emitting lasers
0103 physical sciences
Materials Chemistry
Distributed Bragg reflectors
Thin film
010302 applied physics
business.industry
Metals and Alloys
Surfaces and Interfaces
Sputter deposition
021001 nanoscience & nanotechnology
Distributed Bragg reflector
Surfaces
Coatings and Films
Electronic
Optical and Magnetic Materials
Multilayers
Silicon nitride
chemistry
Physical vapor deposition
[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]
[SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic
Optical coatings
Microcavity
0210 nano-technology
business
Zdroj: Thin Solid Films
Thin Solid Films, 2011, 519 (18), pp.6178-6182. ⟨10.1016/j.tsf.2011.04.111⟩
Thin Solid Films, Elsevier, 2011, 519 (18), pp.6178-6182. ⟨10.1016/j.tsf.2011.04.111⟩
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2011.04.111
Popis: International audience; In this work, we report a study of hydrogenated amorphous silicon (a-SiH) films deposited by radio frequency magnetron sputtering for application in Vertical Cavity Surface Emitting Lasers (VCSEL) elaboration. The influence of the hydrogen dilution in the plasma during the deposition on the optical and surface properties is investigated. After selection of the deposition parameters, a-SiH films have been combined with amorphous silicon nitride (a-SiNx) films to provide high reflectivity Bragg reflectors. Distributed Bragg reflector (DBR) based on these quarter wavelength thick dielectric layers have been realized and characterized by optical measurements and compared with theoretical calculations based on the transfer matrix method. A maximum reflectivity of 99.2% at 1.6 μm and a large spectral bandwidth of 700 nm have been reached with only four and a half periods of a-SiH/a-SiNx deposited on a glass substrate. Residual absorption at 1.55 μm has been measured to be as low as 60 cm−1 with a-SiH layers, compared with 400 cm−1 loss with amorphous silicon without hydrogenation step. Finally, DBR comprising six a-SiH/a-SiNx periods have been included in an InP-based VCSEL. Laser emission is demonstrated at room temperature in continuous wave operation with a photopumping experiment.
Databáze: OpenAIRE
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