Atomic layer deposition on 2D transition metal chalcogenides: layer dependent reactivity and seeding with organic ad-layers
| Autor: | Christian Wirtz, Maria O'Brien, Georg S. Duesberg, Andreas Hirsch, Nina C. Berner, Mario Marcia, Toby Hallam, Conor P. Cullen |
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| Rok vydání: | 2015 |
| Předmět: |
Materials science
Surface Properties Inorganic chemistry Metals and Alloys General Chemistry Naturwissenschaftliche Fakultät Catalysis Surfaces Coatings and Films Electronic Optical and Magnetic Materials Atomic layer deposition Chalcogen Transition metal ddc:540 Monolayer Aluminum Oxide Transition Elements Materials Chemistry Ceramics and Composites Chalcogens Reactivity (chemistry) Seeding Organic Chemicals Deposition (chemistry) Layer (electronics) |
| Zdroj: | Chemical Communications. 51:16553-16556 |
| ISSN: | 1364-548X 1359-7345 |
| Popis: | This commmunication presents a study of atomic layer deposition of Al2O3 on transition metal dichalcogenide (TMD) two-dimensional films which is crucial for use of these promising materials for electronic applications. Deposition of Al2O3 on pristine chemical vapour deposited MoS2 and WS2 crystals is demonstrated. This deposition is dependent on the number of TMD layers as there is no deposition on pristine monolayers. In addition, we show that it is possible to reliably seed the deposition, even on the monolayer, using non-covalent functionalisation with perylene derivatives as anchor unit. |
| Databáze: | OpenAIRE |
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