Effective surface oxidation of polymer replica molds for nanoimprint lithography
| Autor: | Dajung Hong, Sanggyu Yim, Ilhwan Ryu |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2012 |
| Předmět: |
chemistry.chemical_classification
Nanostructure Materials science Nano Express Replica Nanochemistry Nanotechnology Polymer engineering.material Condensed Matter Physics medicine.disease_cause Nanoimprint lithography law.invention Contact angle Materials Science(all) chemistry Coating law Mold medicine engineering General Materials Science |
| Zdroj: | Nanoscale Research Letters NANOSCALE RESEARCH LETTERS(7) |
| ISSN: | 1556-276X 1931-7573 |
| Popis: | In nanoimprint lithography, a surface oxidation process is needed to produce an effective poly(dimethylsiloxane) coating that can be used as an anti-adhesive surface of template molds. However, the conventional photooxidation technique or acidic oxidative treatment cannot be easily applied to polymer molds with nanostructures since surface etching by UV radiation or strong acids significantly damages the surface nanostructures in a short space of time. In this study, we developed a basic oxidative treatment method and consequently, an effective generation of hydroxyl groups on a nanostructured surface of polymer replica molds. The surface morphologies and water contact angles of the polymer molds indicate that this new method is relatively nondestructive and more efficient than conventional oxidation treatments. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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