Hard a-C(N):H films obtained from plasma decomposition of methylamine-containing mixtures
| Autor: | F. L. Freire, Gino Mariotto, D. F. Franceschini, M. M. Lacerda |
|---|---|
| Rok vydání: | 1997 |
| Předmět: |
Materials science
Methylamine Mechanical Engineering Analytical chemistry plasma decomposition of methylamine chemistry.chemical_element General Chemistry Decomposition Nanocrystalline material Electronic Optical and Magnetic Materials Amorphous solid Hard a-C(N):H films plasma decomposition of methylamine Raman spectroscopy chemistry.chemical_compound symbols.namesake chemistry Plasma-enhanced chemical vapor deposition Raman spectroscopy Materials Chemistry symbols Atomic ratio Hard a-C(N):H films Electrical and Electronic Engineering Carbon |
| Zdroj: | Scopus-Elsevier |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/s0925-9635(96)00749-2 |
| Popis: | Hard amorphous hydrogenated carbon-nitrogen films were obtained by PECVD of pure methylamine and methylamine-acetylene mixtures. The chemical composition of the films was determined by nuclear techniques, and their structure examined by infrared and Raman spectroscopies. The film obtained from pure methylamine have a N C atomic ratio of 0.64, and a Raman spectrum that is characteristic of nanocrystalline graphitic carbon films. The films obtained from acetylene-methylamine mixtures show the same dependence of the structure details on the nitrogen content as already observed in a-C(N):H films deposited using other gas mixtures, i.e. a progressive increase in sp2 character of the carbon atoms when the nitrogen content in the film increases. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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