Thin Film Barrier Layers with Increased Performance and Reduced Long-Term Degradation in SOFCs

Autor: Alex Morata, Federico Baiutti, Francesca Martinelli, Dario Montinaro, Lucile Bernadet, Marc Torrell, Albert Tarancón
Rok vydání: 2021
Předmět:
Zdroj: ECS Transactions. 103:1177-1185
ISSN: 1938-6737
1938-5862
DOI: 10.1149/10301.1177ecst
Popis: Gadolinium-doped ceria (CGO) is placed between yttrium-stabilized zirconia (YSZ) electrolyte and strontium-based electrode as a barrier layer to avoid the formation of SrZrO3 insulating phase during solid oxide fuel cell operation. This phase is observed in as-fabricated state-of-the-art cells, which evidences cation inter-diffusion during the sintering process [1]. The impact of this element to the degradation of cells is still under study, in part due to the high complexity of long-term tests necessary for the appropriate understanding of the involved phenomena. Among the efforts for improving barrier layers, the use of vacuum techniques such as sputtering and Large Area Pulsed Laser Deposition (LA-PLD) have been explored, allowing the implementation of dense layers at lower processing temperature compared with traditional deposition techniques (i. e. screen printing). CGO barrier layer thin film deposition and annealing parameters were previously optimized in a leading to an important increase of power density compared to a state-of-the-art button cell at 750ºC using a dense layer of 2 µm. Remarkable results were also obtained when the PLD barrier layer was up-scaled to large area cells of 80 cm2 and tested in short-stack configuration for long-term operation [2]. Here we present a thorough investigation of post mortem cells operated in short-stacks under realistic conditions during 15000h, comparing cells produced with state-of-the-art techniques with those produced by LA-PLD. At the light of the results, we provide tools for the improvement of the fabricated thin film layers, by finding the optimal combination between the protective role of the diffusion barrier layer, a good performance and the reduction of the PLD deposition time. Button cells with PLD barrier layer of 800 nm, 400 nm and 200 nm were fabricated and tested in SOFC mode at 750ºC. It is shown that the barrier layer thickness has no impact on the electrochemical performance and the durability which allows the use of thinner layers and a drastic reduction of the deposition time of the CGO barrier layer made by PLD. Summed to the increased performance, the durability of the layers is evaluated, subjecting the cell with the thinnest film to an aging process for 3,500 h. Post-mortem characterization of the barrier layers and interfaces was conducted by Scanning-electronic microscope and Electron Probe Micro Analysis with Wavelength Dispersive X-Ray (EPMA-WDX) to observe any microstructural changes as well as any changes in composition due to cation inter-diffusion. [1] Morales et al., Journal of Power Sources 344 (2017) 141-151. [2] Morales et al. ACS Applied Energy Materials 1 (2018) 1955-1964.
Databáze: OpenAIRE
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