Optically Defined Multifunctional Patterning of Photosensitive Thin-Film Silica Mesophases

Autor:	Nicola Huesing, Hongyou Fan, Barrett G. Potter, C. Jeffrey Brinker, Dhaval A. Doshi, Alan J. Hurd, Mengcheng Lu, Kelly Simmons-Potter, Yunfeng Lu
Rok vydání:	2000
Předmět:	Multidisciplinary Materials science business.industry Mesophase Dielectric Mesoporous silica Optics Etching (microfabrication) Optoelectronics Wetting Thin film business Lithography Refractive index
Zdroj:	Science. 290:107-111
ISSN:	1095-9203 0036-8075
Popis:	Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. UV-exposure promoted localized acid-catalyzed siloxane condensation, enabling selective etching of unexposed regions, thereby serving as a resistless technique to prepare patterned mesoporous silica. The authors also demonstrated an optically-defined mesophase transformation (hexagonal {r_arrow} tetragonal) and patterning of refractive index and wetting behavior. Spatial control of structure and function on the macro- and mesoscales is of interest for sensor arrays, nano-reactors, photonic and fluidic devices, and low dielectric constant films. More importantly, it extends the capabilities of conventional lithography from spatially defining the presence or absence of film to spatial control of film structure and function.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3cf8afa52a9fe2457b46dc0baa7ed9c5 https://doi.org/10.1126/science.290.5489.107 Zobrazit plný text záznamu Plný text ve formátu PDF