Comparison of approaches in the manufacture of broadband mirrors for the EUV range: aperiodic and stack structures
| Autor: | S. A. Garakhin, N. N. Salashchenko, S. Yu. Zuev, S. Yulin, M. V. Svechnikov, M. M. Barysheva, Nikolay I. Chkhalo, Vladimir N. Polkovnikov |
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| Přispěvatelé: | Publica |
| Rok vydání: | 2019 |
| Předmět: |
Range (particle radiation)
Materials science business.industry Extreme ultraviolet lithography Statistical and Nonlinear Physics Sputter deposition Inverse problem Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Optics Stack (abstract data type) Aperiodic graph Broadband Electrical and Electronic Engineering business |
| Zdroj: | Quantum Electronics. 49:380-385 |
| ISSN: | 1468-4799 1063-7818 |
| DOI: | 10.1070/qel16990 |
| Popis: | We have developed the design and experimentally studied aperiodic and stack broadband Mo/Si mirrors for the purposes of the KORTES project, optimised for uniform reflection in the 17 - 21 nm wavelength range. It is shown that stack structures with an insignificant loss in the reflection coefficient are much more preferable from the point of view of manufacturing and certification, which, in turn, makes it possible to correct the deposition process and to reach the calculated parameters of a multilayer mirror in a small number of iterations. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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