Ion energy control via the electrical asymmetry effect to tune coating properties in reactive radio frequency sputtering
| Autor: | Peter Awakowicz, Daniel Primetzhofer, Lars Banko, Julian Schulze, Jochen M. Schneider, Marcus Hans, Stefan Ries, Alfred Ludwig |
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| Jazyk: | angličtina |
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Plasma parameters multi-frequency capacitively coupled plasmas retarding field energy analyzer 01 natural sciences 010305 fluids & plasmas Ion Fusion plasma och rymdfysik Sputtering 0103 physical sciences ddc:530 Capacitively coupled plasma aluminium nitride Thin film 010302 applied physics plasma surface interaction Range (particle radiation) plasma confinement voltage waveform tailoring Plasma Condensed Matter Physics Fusion Plasma and Space Physics electrical asymmetry effect Plasma parameter Atomic physics |
| Zdroj: | Plasma sources science and technology 28(11), 114001 (2019). doi:10.1088/1361-6595/ab504b special issue: "Special Issue on Waveform Tailoring in Low Temperature Plasmas / Guest Editors: Julian Schulze, Ruhr University Bochum, Germany ; Erik Johnson, Ecole Polytechnique, Paris, France ; Trevor Lafleur, PlasmaPotential Canberra, Australia ; Zoltan Donko, Wigner Research Centre for Physics, Budapest, Hungary" |
| ISSN: | 1361-6595 |
| Popis: | Plasma sources science and technology 28(11), 114001 (2019). doi:10.1088/1361-6595/ab504b special issue: "Special Issue on Waveform Tailoring in Low Temperature Plasmas / Guest Editors: Julian Schulze, Ruhr University Bochum, Germany ; Erik Johnson, Ecole Polytechnique, Paris, France ; Trevor Lafleur, PlasmaPotential Canberra, Australia ; Zoltan Donko, Wigner Research Centre for Physics, Budapest, Hungary" Published by IOP Publ., Bristol |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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