Electronic Transport Properties of Epitaxial Si/SiGe Heterostructures Grown on Single-Crystal SiGe Nanomembranes
| Autor: | José R. Sánchez-Pérez, Mark A. Eriksson, Xian Wu, Xiaorui Cui, Donald E. Savage, RB Jacobson, Deborah M. Paskiewicz, Dan Ward, Yize Stephanie Li, Susan Coppersmith, Max G. Lagally, Pornsatit Sookchoo, Ryan H. Foote, R. T. Mohr |
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| Rok vydání: | 2015 |
| Předmět: |
Materials science
Silicon Condensed matter physics General Engineering General Physics and Astronomy chemistry.chemical_element Heterojunction Quantum Hall effect Condensed Matter::Mesoscopic Systems and Quantum Hall Effect Epitaxy Condensed Matter::Materials Science Strain engineering chemistry Impurity Hall effect Condensed Matter::Strongly Correlated Electrons General Materials Science Single crystal |
| Zdroj: | ACS nano. 9(5) |
| ISSN: | 1936-086X |
| Popis: | To assess possible improvements in the electronic performance of two-dimensional electron gases (2DEGs) in silicon, SiGe/Si/SiGe heterostructures are grown on fully elastically relaxed single-crystal SiGe nanomembranes produced through a strain engineering approach. This procedure eliminates the formation of dislocations in the heterostructure. Top-gated Hall bar devices are fabricated to enable magnetoresistivity and Hall effect measurements. Both Shubnikov-de Haas oscillations and the quantum Hall effect are observed at low temperatures, demonstrating the formation of high-quality 2DEGs. Values of charge carrier mobility as a function of carrier density extracted from these measurements are at least as high or higher than those obtained from companion measurements made on heterostructures grown on conventional strain graded substrates. In all samples, impurity scattering appears to limit the mobility. |
| Databáze: | OpenAIRE |
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