| Autor: |
Charalampos Sakkas, Jean-Marc Cote, Joseph Gavoille, Jean-Yves Rauch, Pierre-Henri Cornuault, Anna Krystianiak, Olivier Heintz, Nicolas Martin |
| Jazyk: |
angličtina |
| Rok vydání: |
2022 |
| Předmět: |
|
| Zdroj: |
Coatings; Volume 12; Issue 11; Pages: 1711 |
| ISSN: |
2079-6412 |
| DOI: |
10.3390/coatings12111711 |
| Popis: |
Titanium-boron-nitrogen (Ti-B-N) thin films were deposited by RF reactive magnetron sputtering using a titanium diboride (TiB2) target in an argon + nitrogen mixture. The argon mass flow rate was kept constant, whereas that of nitrogen was pulsed during the deposition. A constant pulsing period of P = 10 s was used, and the introduction time of the nitrogen gas (duty cycle (dc)) was systematically varied from dc = 0 to 100% of the pulsing period. This reactive gas pulsing process allowed the deposition of Ti-B-N thin films with various boron and nitrogen concentrations. Such adjustable concentrations in the films also led to changes in their electronic transport properties. Boron and nitrogen contents exhibited a reverse evolution as a function of the nitrogen duty cycle, which was correlated with the transition from a metallic to semiconducting-like behavior. A percolation model was applied to the electrical conductivity as a function of the nitrogen pulsing parameters, assuming some correlations with the evolution of the Ti-B-N thin film nanostructure. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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