Thermal behavior of MOCVD-grown Cu-clusters on ZnO(1010)
| Autor: | Martin Kroll, Christof Wöll, Thomas Löber, Vadim Schott, Ulrich Köhler |
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| Rok vydání: | 2011 |
| Předmět: |
Materials science
Annealing (metallurgy) Analytical chemistry Oxide General Physics and Astronomy Thermal treatment chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry Oxidation state Microscopy Cluster (physics) Metalorganic vapour phase epitaxy Physical and Theoretical Chemistry |
| Zdroj: | Physical chemistry chemical physics : PCCP. 14(5) |
| ISSN: | 1463-9084 |
| Popis: | Scanning tunnelling microscopy (STM) and X-ray photoelectron spectroscopy (XPS, AES) were used to study MOCVD of Cu-clusters on the mixed terminated ZnO(1010) surface in comparison to MBE Cu-deposition. Both deposition methods result in the same Cu cluster morphology. After annealing to 670 K the amount of Cu visible above the oxide surface is found to decrease substantially, indicating a substantial diffusion of Cu atoms inside the ZnO-bulk. The spectroscopic data do not show any evidence for changes in the Cu oxidation state during thermal treatment up to 770 K. |
| Databáze: | OpenAIRE |
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