Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)
| Autor: | Christopher S. Blackman, Martyn A. McLachlan, Stefan Guldin, Thomas J. Macdonald, Rachel L. Wilson, Claire J. Carmalt, Chieh-Ting Lin, Alaric Taylor, Caroline E. Knapp, Shengda Xu |
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| Rok vydání: | 2021 |
| Předmět: |
Materials science
Valence (chemistry) General Chemical Engineering Nickel oxide Non-blocking I/O Nanoparticle chemistry.chemical_element 02 engineering and technology General Chemistry Chemical vapor deposition Current collector 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Nickel Chemical engineering chemistry Thin film 03 Chemical Sciences 0210 nano-technology |
| Zdroj: | RSC Advances. 11:22199-22205 |
| ISSN: | 2046-2069 |
| DOI: | 10.1039/d1ra03263a |
| Popis: | Nickel oxide (NiO) has good optical transparency and wide band-gap, and due to the particular alignment of valence and conduction band energies with typical current collector materials has been used in solar cells as an efficient hole transport-electron blocking layer, where it is most commonly deposited via sol–gel or directly deposited as nanoparticles. An attractive alternative approach is via vapour deposition. This paper describes the chemical vapour deposition of p-type nickel oxide (NiO) thin films using the new nickel CVD precursor [Ni(dmamp′)2], which unlike previous examples in literature is synthesised using the readily commercially available dialkylaminoalkoxide ligand dmamp′ (2-dimethylamino-2-methyl-1-propanolate). The use of vapour deposited NiO as a blocking layer in a solar-cell device is presented, including benchmarking of performance and potential routes to improving performance to viable levels. |
| Databáze: | OpenAIRE |
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