Lithium niobate thick films grown by RF sputtering : correlation between optical analysis and transmission electron microscopy observations

Autor: Elhadj Dogheche, X. Lansiaux, Denis Remiens
Přispěvatelé: Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
Jazyk: angličtina
Rok vydání: 2000
Předmět:
Zdroj: Integrated Ferroelectrics
Integrated Ferroelectrics, Taylor & Francis, 2000, 31, pp.105-116
Scopus-Elsevier
Integrated Ferroelectrics, 2000, 31, pp.105-116
ISSN: 1058-4587
Popis: We report on the low temperature process for depositing epitaxial LiNbO3 (0001) thick films on sapphire (0001) substrates by radio-frequency magnetron sputtering. To obtain this objective, we have developed a multi-steps process. Structural studies carried out through x-ray Θ-2Θ and phi scans measurements revealed that the epitaxy is verified at a substrate temperature of 490°C whatever the film thickness. The crystalline properties and the surface morphologies are rather conserved in the multi-steps process of deposition. Optical prism coupling characterizations have been carried out to qualify the film and the interface between the film and the substrate. A discussion is proposed in relationship with transmission electron microscopy (TEM) analysis.
Databáze: OpenAIRE