Monolayer Pattern Evolution via Substrate Strain-Mediated Spinodal Decomposition

Autor:	Bradford G. Orr, M. M. Banaszak Holl, Daniel R. Fosnacht, Kevin S. Schneider, Wei Lu, Thomas M. Owens
Rok vydání:	2004
Předmět:	chemistry.chemical_classification Materials science Spinodal decomposition General Physics and Astronomy Pattern formation Substrate (chemistry) Nanotechnology law.invention chemistry Chemical physics law Chemisorption Monolayer Scanning tunneling microscope Surface reconstruction Alkyl
Zdroj:	Physical Review Letters. 93
ISSN:	1079-7114 0031-9007
DOI:	10.1103/physrevlett.93.166104
Popis:	Investigations of octylsilane (C8H17SiH3) monolayer pattern formation on Au(111) are reported. Scanning tunneling microscopy data display the evolution of a approximately 6 nm scale pattern of interwoven features concomitant with ejection of surface Au atoms and relaxation of the Au(111) 23xsqrt[3] surface reconstruction. Numerical simulations suggest the surface dynamics are governed by a substrate strain-mediated spinodal decomposition mechanism, novel to organic monolayer formation. Collectively, the experimental and theoretical data indicate strain-inducing Si-Au bond interactions drive the pattern formation and the alkyl chains play a negligible role.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::39a8070987572d916fd0a9f55f5a7589 https://doi.org/10.1103/physrevlett.93.166104 Zobrazit plný text záznamu