Oxidation of alkylsilane-based monolayers on gold
| Autor: | Mark M. Banaszak Holl, Kevin S. Schneider, Bradford G. Orr, Thomas M. Owens, Bonnie J. Ludwig, Daniel R. Fosnacht |
|---|---|
| Rok vydání: | 2004 |
| Předmět: |
chemistry.chemical_classification
Ozone Analytical chemistry Infrared spectroscopy Surfaces and Interfaces Condensed Matter Physics Photochemistry law.invention chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy law Siloxane Torr Monolayer Electrochemistry General Materials Science Scanning tunneling microscope Spectroscopy Alkyl |
| Zdroj: | Langmuir : the ACS journal of surfaces and colloids. 20(22) |
| ISSN: | 0743-7463 |
| Popis: | The oxidation of alkylsilane monolayers on Au has been studied by X-ray photoelectron spectroscopy, reflection-absorption infrared spectroscopy, contact-angle measurements, and scanning tunneling microscopy. Exposure of the monolayers at 298 K to pure O(2) or H(2)O (>5 x 10(-5) Torr and >150 000 L) does not cause oxidation. Ambient atmosphere only causes oxidation if direct sight lines are maintained to the sample. Ozone exposure results in rapid monolayer oxidation. Oxidation initially occurs only at the Si atom, resulting in formation of a cross-linked siloxane monolayer that retains alkyl surface termination. Prolonged ozone exposures result in the oxidation and subsequent loss of the alkyl chain. |
| Databáze: | OpenAIRE |
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