Plasma clozapine levels and clinical response in treatment-refractory Chinese schizophrenic patients

Autor: Alfert Wai-kiu Tsang, Henry Hon-kee Cheung, Kai-tai Chan, Wing-Kit Choi, Roger Man Kin Ng, Jessica O. Y. Wong, Judy Po Shan Lai, Tony W. L. Mak, Shung-pun Leung
Rok vydání: 2006
Předmět:
Zdroj: Progress in Neuro-Psychopharmacology and Biological Psychiatry. 30:251-264
ISSN: 0278-5846
DOI: 10.1016/j.pnpbp.2005.10.008
Popis: Purpose To evaluate clinical efficacy of clozapine in relation with its plasma level in a group of Chinese patients with treatment-resistant schizophrenia. In addition, the relationship between plasma level and side effects were examined. Method Fifty-one patients with treatment-resistant schizophrenia were put on a fixed dose of clozapine at 300 mg/day for 6 weeks. Non-responders to week 6 received 500 mg/day in subsequent 6 weeks. Responders to week 6 continued to receive 300 mg/day. Clozapine plasma levels were checked at weeks 6 and 12. Findings No association was found between clozapine plasma level, response and side effects. Sodium valproate was found to elevate clozapine plasma level while lowering norclozapine/clozapine ratio. Conclusion Clozapine plasma level was not found to be associated with response and side effect in Chinese treatment-resistant schizophrenic patients. Various explanations were postulated for the lack of relationship observed between clozapine plasma level and response in this population.
Databáze: OpenAIRE