Advanced diffusion system for low contamination in-line rapid thermal processing of silicon solar cells
| Autor: | O. Schultz, R. Schindler, S. Peters, Daniel Biro, Ralf Preu, Gerhard Willeke, R. Ludemann, D.M. Huljic, D. Zickermann |
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| Přispěvatelé: | Publica |
| Rok vydání: | 2002 |
| Předmět: |
lamp-heated furnace
Materials science Silicon low thermal mass shallow lightly doped emitter chemistry.chemical_element SiN diffusion system silicon solar cell walking beam principle Thermal diffusivity lightly doped emitter highly doped emitter Rapid thermal processing Thermal mass Diffusion (business) firing antireflection coating Renewable Energy Sustainability and the Environment business.industry Doping screen printing low contamination in-line rapid thermal processing Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Screen printing shallow emitter Physics::Accelerator Physics Optoelectronics Si metal free transport system business sheet resistance Beam (structure) |
| Zdroj: | Solar Energy Materials and Solar Cells. 74:35-41 |
| ISSN: | 0927-0248 |
| Popis: | A novel diffusion system for in-line rapid thermal diffusion is presented. The lamp-heated furnace has a low thermal mass and a metal free transport system based on the walking beam principle. The furnace has been used to process first solar cells with lightly and highly doped emitters respectively. Solar cells with shallow lightly doped emitters show that the emitters processed in the new device can be well passivated. Shallow emitters with sheet resistances of up to 40 /sq. have been contacted successfully by means of screen printing and firing through a SiNx antireflection coating. |
| Databáze: | OpenAIRE |
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