Measurement of euv lithography pupil amplitude and phase variation via image-based methodology
| Autor: | Markus P. Benk, Kenneth A. Goldberg, Obert Wood, Pawitter Mangat, Erik Verduijn, Antoine Wojdyla, Bruce W. Smith, Zachary Levinson |
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| Jazyk: | angličtina |
| Rok vydání: | 2016 |
| Předmět: |
Zernike polynomials
EUV aberrations Extreme ultraviolet lithography aberration metrology 02 engineering and technology Optical Physics pupil characterization 01 natural sciences Pupil 010309 optics symbols.namesake Optics EUV transmission function 0103 physical sciences Pupil function Nanoscience & Nanotechnology Electrical and Electronic Engineering Legendre polynomials Physics Wavefront Hermite polynomials business.industry Mechanical Engineering Astrophysics::Instrumentation and Methods for Astrophysics 021001 nanoscience & nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Amplitude EUV lithography symbols image-based aberration metrology 0210 nano-technology business |
| Zdroj: | Levinson, Z; Verduijn, E; Wood, OR; Mangat, P; Goldberg, KA; Benk, MP; et al.(2016). Measurement of euv lithography pupil amplitude and phase variation via image-based methodology. Journal of Micro/ Nanolithography, MEMS, and MOEMS, 15(2). doi: 10.1117/1.JMM.15.2.023508. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/8qr2d001 Journal of Micro/ Nanolithography, MEMS, and MOEMS, vol 15, iss 2 Journal of Micro/Nanopatterning Materials and Metrology, vol 15, iss 2 |
| Popis: | © 2016 Society of Photo-Optical Instrumentation Engineers (SPIE). An approach to image-based EUV aberration metrology using binary mask targets and iterative model-based solutions to extract both the amplitude and phase components of the aberrated pupil function is presented. The approach is enabled through previously developed modeling, fitting, and extraction algorithms. We seek to examine the behavior of pupil amplitude variation in real-optical systems. Optimized target images were captured under several conditions to fit the resulting pupil responses. Both the amplitude and phase components of the pupil function were extracted from a zone-plate-based EUV mask microscope. The pupil amplitude variation was expanded in three different bases: Zernike polynomials, Legendre polynomials, and Hermite polynomials. It was found that the Zernike polynomials describe pupil amplitude variation most effectively of the three. |
| Databáze: | OpenAIRE |
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