On Optimization of Doping of a Hetero structure During Manufacturing of P-I-N-Diodes

Autor: E.L. Pankratov, E.A. Bulaeva
Rok vydání: 2018
Předmět:
DOI: 10.5281/zenodo.1489476
Popis: We introduce an approach of manufacturing of a p-i-n-heterodiodes. The approach based on using a δdoped heterostructure, doping by diffusion or ion implantation of several areas of the heterostructure. After the doping the dopant and/or radiation defects have been annealed. We introduce an approach to optimize annealing of the dopant and/or radiation defects. We determine several conditions to manufacture more compact p-i-n-heterodiodes.
Databáze: OpenAIRE