On Optimization of Doping of a Hetero structure During Manufacturing of P-I-N-Diodes
Autor: | E.L. Pankratov, E.A. Bulaeva |
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Rok vydání: | 2018 |
Předmět: | |
DOI: | 10.5281/zenodo.1489476 |
Popis: | We introduce an approach of manufacturing of a p-i-n-heterodiodes. The approach based on using a δdoped heterostructure, doping by diffusion or ion implantation of several areas of the heterostructure. After the doping the dopant and/or radiation defects have been annealed. We introduce an approach to optimize annealing of the dopant and/or radiation defects. We determine several conditions to manufacture more compact p-i-n-heterodiodes. |
Databáze: | OpenAIRE |
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