Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection
| Autor: | F.A. van Goor, A. J. R. van den Boogaard, Eric Louis, Frederik Bijkerk |
|---|---|
| Přispěvatelé: | Laser Physics & Nonlinear Optics, XUV Optics, Faculty of Science and Technology |
| Rok vydání: | 2012 |
| Předmět: | |
| Zdroj: | Optics Letters, 37, 160-162 Optics letters, 37(2), 160-162. The Optical Society |
| ISSN: | 0146-9592 |
| Popis: | A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, lambda = 13.5 nm) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of lambda > 100 nm out-of-band radiation in EUV lithography. (C) 2012 Optical Society of America |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|