Design and fabrication of a diffractive beam splitter for dual-wavelength and concurrent irradiation of process points
| Autor: | Jun Amako, Yu Shinozaki |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Materials science
Spatial light modulator business.industry Quantization (signal processing) Physics::Optics 02 engineering and technology Photoresist 021001 nanoscience & nanotechnology 01 natural sciences Atomic and Molecular Physics and Optics law.invention 010309 optics Wavelength Optics law Splitter 0103 physical sciences Simulated annealing Optoelectronics Diffractive beam splitter 0210 nano-technology business Beam (structure) |
| Zdroj: | Optics express. 24(14) |
| ISSN: | 1094-4087 |
| Popis: | We report on a dual-wavelength diffractive beam splitter designed for use in parallel laser processing. This novel optical element generates two beam arrays of different wavelengths and allows their overlap at the process points on a workpiece. To design the deep surface-relief profile of a splitter using a simulated annealing algorithm, we introduce a heuristic but practical scheme to determine the maximum depth and the number of quantization levels. The designed corrugations were fabricated in a photoresist by maskless grayscale exposure using a high-resolution spatial light modulator. We characterized the photoresist splitter, thereby validating the proposed beam-splitting concept. |
| Databáze: | OpenAIRE |
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