A Tensorial High-Field Electron Mobility Model for Strained Silicon

Autor: Tibor Grasser, E. Ungersboeck, Hans Kosina, S. Dhar, G. Karlowatz, Siegfried Selberherr
Rok vydání: 2006
Předmět:
Zdroj: Scopus-Elsevier
DOI: 10.1109/istdm.2006.246511
Popis: Application of stress to Si causes a deviation of its lattice constant from the equilibrium value, thereby modifying the electronic band structure. A phenomenological approach to calculate the mobility tensor for electrons in strained Si at high electric fields has been proposed. The model is intended for implementation in drift-diffusion based device simulators
Databáze: OpenAIRE