Andreev Interference in the Surface Accumulation Layer of Half-Shell InAsSb/Al Hybrid Nanowires

Autor: Lukas Stampfer, Damon J. Carrad, Dags Olsteins, Christian E. N. Petersen, Sabbir A. Khan, Peter Krogstrup, Thomas S. Jespersen
Rok vydání: 2022
Předmět:
Zdroj: Advanced Materials
Stampfer, L, Carrad, D J, Olsteins, D, Petersen, C E N, Khan, S A, Krogstrup, P & Jespersen, T S 2022, ' Andreev Interference in the Surface Accumulation Layer of Half-Shell InAsSb/Al Hybrid Nanowires ', Advanced Materials, vol. 34, no. 11, 2108878 . https://doi.org/10.1002/adma.202108878
ISSN: 1521-4095
DOI: 10.1002/adma.202108878
Popis: Understanding the spatial distribution of charge carriers in III–V nanowires proximity coupled to superconductors is important for the design and interpretation of experiments based on hybrid quantum devices. In this letter, the gate-dependent surface accumulation layer of half-shell InAsSb/Al nanowires is studied by means of Andreev interference in a parallel magnetic field. Both uniform hybrid nanowires and devices featuring a short Josephson junction fabricated by shadow lithography, exhibit periodic modulation of the switching current. The period corresponds to a flux quantum through the nanowire diameter and is consistent with Andreev bound states occupying a cylindrical surface accumulation layer. The spatial distribution is tunable by a gate potential as expected from electrostatic models.
Databáze: OpenAIRE