Stress tuning in sputter-deposited MoOx films
| Autor: | Jean-Yvon Faou, Sergey Grachev, Etienne Barthel |
|---|---|
| Přispěvatelé: | Surface du Verre et Interfaces (SVI), Centre National de la Recherche Scientifique (CNRS) |
| Rok vydání: | 2013 |
| Předmět: |
Materials science
Inorganic chemistry chemistry.chemical_element 02 engineering and technology Substrate (electronics) Stress 01 natural sciences Oxygen Stress (mechanics) Sputtering 0103 physical sciences Materials Chemistry Thin film Deposition (law) Molybdenum 010302 applied physics MoOx Metals and Alloys Surfaces and Interfaces Sputter deposition Molybdenum oxide 021001 nanoscience & nanotechnology Microstructure Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Chemical engineering [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] 0210 nano-technology |
| Zdroj: | Thin Solid Films Thin Solid Films, Elsevier, 2013, 527, pp.222-226. ⟨10.1016/j.tsf.2012.11.053⟩ |
| ISSN: | 0040-6090 |
| Popis: | International audience; The evolution of the compressive stress in Mo/MoOx sputter-deposited thin films has been followed in situ during deposition as a function of two parameters: the oxygen flux and the negative voltage bias applied to the substrate. In addition the microstructure of the films has been characterized. Oxygen accumulation at the interface was observed. We describe the origins of the stress in terms of ion bombardment and oxygen incorporation. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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