Atomic layer deposited aluminum oxide barrier coatings for packaging materials
| Autor: | Tuomas Mustonen, Eero Iiskola, Terhi Hirvikorpi, Maarit Karppinen, Mika Vähä-Nissi |
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| Jazyk: | angličtina |
| Rok vydání: | 2010 |
| Předmět: |
Materials science
chemistry.chemical_element Oxygen aluminum oxide chemistry.chemical_compound Atomic layer deposition Materials Chemistry diffusion barriers Composite material Porosity ta116 polymers chemistry.chemical_classification Metals and Alloys technology industry and agriculture Surfaces and Interfaces Polymer Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry packaging material biodegradable polymers atomic layer deposition Aluminium oxide Porous medium Layer (electronics) Water vapor |
| Zdroj: | Hirvikorpi, T, Vähä-Nissi, M, Mustonen, T, Iiskola, E & Karppinen, M 2010, ' Atomic layer deposited aluminum oxide barrier coatings for packaging materials ', Thin Solid Films, vol. 518, no. 10, pp. 2654-2658 . https://doi.org/10.1016/j.tsf.2009.08.025 |
| ISSN: | 1879-2731 0040-6090 |
| DOI: | 10.1016/j.tsf.2009.08.025 |
| Popis: | Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al 2 O 3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas. |
| Databáze: | OpenAIRE |
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