SYNTHESIS OF CARBON NANOSTRUCTURES BY PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION AT ATMOSPHERIC PRESSURE
| Autor: | Ondřej Jašek, Marek Eliáš, Lenka Zajíčková, Vít Kudrle, Petr Synek |
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| Jazyk: | angličtina |
| Rok vydání: | 2010 |
| Předmět: |
010302 applied physics
Materials science Laser ablation Atmospheric pressure business.industry carbon nanostructures plasma enhanced chemical vapour deposition atmospheric pressure Nanotechnology 02 engineering and technology Chemical vapor deposition Plasma uhlíkové nanostruktury PECVD atmosférický tlak 021001 nanoscience & nanotechnology 01 natural sciences Plasma-enhanced chemical vapor deposition 0103 physical sciences Microelectronics Metalorganic vapour phase epitaxy Electrical and Electronic Engineering 0210 nano-technology business Plasma processing |
| Zdroj: | Journal of Electrical Engineering Proccedings NANOVED NANOTECH TECHTRANSFER 10 ResearcherID Scopus-Elsevier |
| Popis: | Carbon nanostructures present the leading field in nanotechnology research. A wide range of chemical and physical methods was used for carbon nanostructures synthesis including arc discharges, laser ablation and chemical vapour deposition. Plasma enhanced chemical vapour deposition (PECVD) with its application in modern microelectronics industry became soon target of research in carbon nanostructures synthesis. Selection of the ideal growth process depends on the application. Most of PECVD techniques work at low pressure requiring vacuum systems. However for industrial applications it would be desirable to work at atmospheric pressure. In this article carbon nanostructures synthesis by plasma discharges working at atmospheric pressure will be reviewed. Uhlíkové nanostruktury patří mezi vedoucí nanotechnologický výzkum. K syntéze uhlíkových nanostruktur lze použít širokou škálu chemických a fyzikálních metod jako například obloukové výboje, laserovou ablaci a CVD. PECVD se svých uplatněním v mikroelektronice se brzy stalo cílem výzkumu i v této oblasti. Výběr metod úzce souvisí s aplikací dané technologie. Ačkoli mnoho metod pracuje při nízkém tlaku, z hlediska aplikací by bylo vhodné použít metodou pracující za atmosférického tlaku. V této publikaci jsou shrnuty metody syntézy uhlíkových nanostruktur za atmosférického tlaku. Carbon nanostructures present the leading field in nanotechnology research. A wide range of chemical and physical methods was used for carbon nanostructures synthesis including arc discharges, laser ablation and chemical vapour deposition. Plasma enhanced chemical vapour deposition (PECVD) with its application in modern microelectronics industry became soon target of research in carbon nanostructures synthesis. Selection of the ideal growth process depends on the application. Most of PECVD techniques work at low pressure requiring vacuum systems. However for industrial applications it would be desirable to work at atmospheric pressure. In this article carbon nanostructures synthesis by plasma discharges working at atmospheric pressure will be reviewed. |
| Databáze: | OpenAIRE |
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