Development of prototype hat patterns for elderly women based on three-dimensional modeling
| Autor: | Sunmi Park, Kuengmi Choi, Jungil Jun, Youngshil Ryoo |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2021 |
| Předmět: |
Cultural Studies
Head size 010407 polymers Aging Social Psychology Computer science Strategy and Management Materials Science (miscellaneous) Population Social Sciences 01 natural sciences Active seniors Head shape Elderly population 0502 economics and business TP890-933 Computer vision Hat prototype pattern education Consumer group Marketing education.field_of_study Digital fashion business.industry Wire frame 05 social sciences Standard head form Wearable technology Dimensional modeling Textile bleaching dyeing printing etc humanities 0104 chemical sciences 050211 marketing Artificial intelligence business |
| Zdroj: | Fashion and Textiles, Vol 8, Iss 1, Pp 1-21 (2021) |
| ISSN: | 2198-0802 |
| Popis: | Population aging is a global phenomenon, and the elderly population has a higher economic capability today than that in the past. Thus, this population is considered to be a growing consumer group that enjoys both consumer and leisure life. In this study, we developed prototype hat patterns for elderly women that can be used for developing close-fitting hats, helmets, masks, and smart headwear. Three-dimensional (3D) head scan data of elderly women were employed herein, and the data were classified into three groups with common head size and head shape. The target group was selected from a high-frequency group among the classified groups, and a standard head form representing the target group was developed using averaging and wire frame generation techniques. Four hat types were considered, design baselines were developed for each type, and prototype patterns were designed for each hat type using a flattening technique. The suitability of the developed prototype hat patterns was subsequently verified. Our results showed that all four prototype patterns had errors less than 5 mm2 (1.40%). The hat patterning method proposed in this study is expected to improve the wearing comfort of high-value-added products designed for the elderly. |
| Databáze: | OpenAIRE |
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