Deep etched DBR gratings in InP for photonic integrated circuits

Autor:	B. Docter, Mjh Sander-Jochem, E.J. Geluk, MK Meint Smit, F Fouad Karouta
Přispěvatelé:	Photonic Integration
Jazyk:	angličtina
Rok vydání:	2007
Předmět:	Fabrication Materials science business.industry Photonic integrated circuit Distributed Bragg reflector law.invention Etching (microfabrication) law Optoelectronics Photolithography Photonics business Diffraction grating Lithography
Zdroj:	Proceedings of the 2007 IEEE 19th International Conference on Indium Phosphide & Related Materials (IPRM 2007) 14-18 May 2007, Matsue, Japan, 226-228 STARTPAGE=226;ENDPAGE=228;TITLE=Proceedings of the 2007 IEEE 19th International Conference on Indium Phosphide & Related Materials (IPRM 2007) 14-18 May 2007, Matsue, Japan
DOI:	10.1109/ICIPRM.2007.381164
Popis:	A novel fabrication process was developed to realize high quality SiOx masks for Cl2 based ICP etching of InP. First order DBR mirrors, 3 µm deep, were realized that can be used in photonic integrated circuits. The process can be used in combination with conventional optical lithography, reducing production cost.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2c21588d3f7d816890ad1d9484411843 https://doi.org/10.1109/ICIPRM.2007.381164 Zobrazit plný text záznamu