Nanoscale Ruthenium-Containing Deposits from Ru(CO)4I2 via Simultaneous Focused Electron Beam-Induced Deposition and Etching in Ultrahigh Vacuum: Mask Repair in Extreme Ultraviolet Lithography and Beyond
| Autor: | Bilgilisoy, Elif, Yu, Jo-Chi, Preischl, Christian, McElwee-White, Lisa, Steinrück, Hans-Peter, Marbach, Hubertus |
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| Rok vydání: | 2022 |
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| Zdroj: | ACS Applied Nano Mater |
| ISSN: | 2574-0970 |
| DOI: | 10.1021/acsanm.1c04481 |
| Databáze: | OpenAIRE |
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