Edge Trapping of Exciton-Polariton Condensates in Etched Pillars
| Autor: | D. M. Myers, Jonathan Beaumariage, David W. Snoke, Loren Pfeiffer, Ken W. West, Jeffrey Wuenschell, Burcu Ozden |
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| Rok vydání: | 2017 |
| Předmět: |
Physics and Astronomy (miscellaneous)
Exciton FOS: Physical sciences 02 engineering and technology Trapping Edge (geometry) 01 natural sciences Molecular physics law.invention law 0103 physical sciences Mesoscale and Nanoscale Physics (cond-mat.mes-hall) Polariton Reactive-ion etching 010306 general physics Physics Condensed Matter::Quantum Gases Condensed Matter - Mesoscale and Nanoscale Physics Condensed Matter::Other Condensation Pillar 021001 nanoscience & nanotechnology Photolithography 0210 nano-technology Physics - Optics Optics (physics.optics) |
| DOI: | 10.48550/arxiv.1705.01125 |
| Popis: | In this letter, we present a study of the condensation of exciton-polaritons in large etched pillar structures that exhibit shallow edge trapping. The $\approx$ 100 $\mu$m $\times$ 100 $\mu$m pillars were fabricated using photolithography and a BCl$_3$/Cl$_2$ reactive ion etch. A low energy region emerged along the etched edge, with the minima $\approx$ 7 $\mu$m from the outer edge. The depth of the trap was 0.5-1.5 meV relative to the level central region, with the deepest trapping at the corners. We were able to produce a Bose-Einstein condensate in the trap near the edges and corners by pumping non-resonantly in the middle of the pillar. This condensate began as a set of disconnected condensates at various points along the edges, but then became a single mono-energetic condensate as the polariton density was increased. Similar edge traps could be used to produce shallow 1D traps along edges or other more complex traps using various etch geometries and scales. Comment: 5 pages, 7 figures. To be published in Applied Physics Letters. Replaced preprint with the accepted manuscript |
| Databáze: | OpenAIRE |
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