Role of boron diffusion in CoFeB/MgO magnetic tunnel junctions

Autor: Johan Persson, Seyed Majid Mohseni, Abhijit Hazarika, Anindita Sahoo, Tuan Le, D. D. Sarma, Wolfgang Drube, Ronny Knut, Sebastian Thiess, Sumanta Mukherjee, T. N. Anh Nguyen, Mihaela Gorgoi, Banabir Pal, Johan Åkerman, Olof Karis, Sunjae Chung, P. S. Anil Kumar
Jazyk: angličtina
Rok vydání: 2015
Předmět:
Zdroj: Physical review / B 91(8), 085311 (2015). doi:10.1103/PhysRevB.91.085311
DOI: 10.1103/PhysRevB.91.085311
Popis: Several scientific issues concerning the latest generation read heads for magnetic storage devices, based on CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) are known to be controversial, including such fundamental questions as to the behavior and the role of B in optimizing the physical properties of these devices. Quantitatively establishing the internal structures of several such devices with different annealing conditions using hard x-ray photoelectron spectroscopy, we resolve these controversies and establish that the B diffusion is controlled by the capping Ta layer, though Ta is physically separated from the layer with B by several nanometers. While explaining this unusual phenomenon, we also provide insight into why the tunneling magnetoresistance (TMR) is optimized at an intermediate annealing temperature, relating it to B diffusion, coupled with our studies based on x-ray diffraction and magnetic studies.
Databáze: OpenAIRE