Spectral-purity-enhancing layer for multilayer mirrors

Autor:	S. Alonso van der Westen, D. J. W. Klunder, Vadim Yevgenyevich Banine, Eric Louis, Frederik Bijkerk, R. W. E. van de Kruijs, Andrey E. Yakshin, M. M. J. W. van Herpen
Přispěvatelé:	XUV Optics
Rok vydání:	2008
Předmět:	Materials science business.industry Extreme ultraviolet lithography Physics::Optics Radiation Atomic and Molecular Physics and Optics Optics Optical coating Extreme ultraviolet Optoelectronics Thin film business Lithography Refractive index Spectral purity
Zdroj:	Optics Letters, 33, 560-562 Optics letters, 33(6), 560-562. The Optical Society
ISSN:	0146-9592
Popis:	We demonstrate, both theoretically and experimentally, that special spectral-purity-enhancing multilayer mirror systems can be designed and fabricated to substantially reduce the level of out-of-band radiation expected in an extreme ultraviolet lithographic tool. A first proof of principle of applying such spectral-purity-enhancement layers showed reduced out-of-band reflectance by a factor of five, while the in-band reflectance is only 4.5% (absolute) less than for a standard capped multilayer. (C) 2008 Optical Society of America.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::29f78ea5d501afa01213fe8f13c845ec https://pubmed.ncbi.nlm.nih.gov/18347709 Zobrazit plný text záznamu