Single walled carbon nanotube membranes for optical applications in the extreme ultraviolet range
| Autor: | Franz Schäfers, Andrey Sokolov, Yu. G. Gladush, M.G. Sertsu, Albert G. Nasibulin, V.Y. Yakovlev, Igor Ostanin, O. F. Yakushev, V. M. Krivtsun, Viacheslav Medvedev, V.M. Gubarev |
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| Přispěvatelé: | Multi Scale Mechanics, MESA+ Institute |
| Rok vydání: | 2019 |
| Předmět: |
Materials science
business.industry Extreme ultraviolet lithography Synchrotron radiation Large scale facilities for research with photons neutrons and ions 02 engineering and technology General Chemistry Chemical vapor deposition Carbon nanotube 010402 general chemistry 021001 nanoscience & nanotechnology 22/4 OA procedure 01 natural sciences 0104 chemical sciences law.invention Wavelength law Extreme ultraviolet Transmittance Optoelectronics General Materials Science Thin film 0210 nano-technology business |
| Zdroj: | Carbon, 155, 734-739. Elsevier |
| ISSN: | 0008-6223 |
| Popis: | In this paper, we explore the possibility of using free standing thin films from single walled carbon nanotube SWCNT material in optics of the extreme ultraviolet EUV range. Test samples were fabricated using an aerosol chemical vapor deposition method. Synchrotron radiation was used to record the transmittance spectra of samples in the EUV range. The measured transmittance for a film 40 amp; 8239;nm thick almost monotonously increases from 76 at a wavelength of 20 amp; 8239;nm 99 at a wavelength of 1 amp; 8239;nm. The measured stress strain curve for the test samples shows that the SWCNT based thin films have rather high ductility as opposite to fragile films made of conventional solid state materials. We use numerical simulations to demonstrate that the film strain occurs mainly by straightening and sliding of the nanotubes past each other without forming of strain localization responsible for fragile behavior. The combination of high radiation transmittance and unique mechanical properties makes the SWCNT based thin films very promising for use in the EUV optics. In particular, such films can be used to protect delicate optical elements for EUV lithography from their contamination with debris particles |
| Databáze: | OpenAIRE |
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